Uvexp/meta: Difference between revisions
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{{{{ProjectMetaFormat|format={{{format}}}}} | {{{{ProjectMetaFormat|format={{{format}}}}}|tag_filter={{{tag_filter|}}} | ||
|name= | |name=UV exposure | ||
|wikiPageName=Uvexp | |wikiPageName=Uvexp | ||
|image=[[File:IMG 20120306 214844.jpg|290px]] | |image=[[File:IMG 20120306 214844.jpg|290px]] | ||
|founder= | |founder=hexo | ||
|coops=rmarko | |||
|tags=hw | |tags=hw | ||
|hwlic= | |hwlic= | ||
|status=active | |status=active | ||
|shortdesc= | |shortdesc=UV exposure device for PCB etching | ||
|created=2012-03-06 | |created=2012-03-06 | ||
}} | }} | ||
Latest revision as of 23:34, 18 March 2012
UV exposure
Founder:
hexo
Coops:
rmarko
Status:
active
Created:
2012-03-06
Last Modified:
{{#REVISIONYEAR:Uvexp}}-{{#REVISIONMONTH2:Uvexp}}-{{#REVISIONDAY:Uvexp}}